I. Pollentier: search on Z-Library

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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Novel metal containing resists for EUV lithography extendibility

Panning, Eric M., Goldberg, Kenneth A., De Simone, Danilo, Sayan, Safak, Dei, Satoshi, Pollentier, Ivan, Kuwahara, Yuhei, Vandenberghe, Geert, Nafus, Kathleen, Shiratani, Motohiro, Nakagawa, Hisashi,

Year:

2016

Language:

english

File:

PDF, 1.28 MB

english, 2016

2

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Top coat or no top coat for immersion lithography?

Stepanenko, N., Lin, Qinghuang, Kim, Hyun-Woo, Kishimura, S., Van Den Heuvel, D., Vandenbroeck, N., Kocsis, M., Foubert, P., Maenhoudt, M., Ercken, M., Van Roey, F., Gronheid, R., Pollentier, I., Vang

Year:

2006

Language:

english

File:

PDF, 498 KB

english, 2006

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Relationship between resist outgassing and EUV witness sample contamination in NXE outgas qualification using electrons and EUV photons

Wood, Obert R., Panning, Eric M., Pollentier, I., Tirumala Venkata, A., Gronheid, R.

Year:

2014

Language:

english

File:

PDF, 522 KB

english, 2014

4

SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] Lithography for Semiconductor Manufacturing II - Lithography aspects of dual-damascene interconnect technology

Maenhoudt, Mireille, Van Goidsenhoven, Diziana, Pollentier, Ivan K., Ronse, Kurt G., Lepage, Muriel, Struyf, Herbert, Van Hove, Marleen, Mack, Chris A., Stevenson, Tom

Year:

2001

Language:

english

File:

PDF, 1.09 MB

english, 2001

5

Fabrication of a GaAs-AlGaAs GRIN-SCH SQW laser diode on silicon by epitaxial lift-off

Pollentier, I., Buydens, L., Van Daele, P., Demeester, P.

Journal:

IEEE Photonics Technology Letters

Year:

1991

Language:

english

File:

PDF, 304 KB

english, 1991

6

EUV Resist Process Performance Investigations on the NXE3100 Full Field Scanner

Goethals, Anne-Marie, Foubert, Philippe, Hosokawa, Kohei, Roey, Frieda Van, Niroomand, Ardavan, Heuvel, Dieter Van den, Pollentier, Ivan

Journal:

Journal of Photopolymer Science and Technology

Year:

2012

Language:

english

File:

PDF, 1.43 MB

english, 2012

7

An item response analysis of the international restless legs syndrome study group rating scale for restless legs syndrome

Glen R. Wunderlich, Kenneth R. Evans, Terrence Sills, Stephane Pollentier, Juergen Reess, Richard P. Allen, Wayne Hening, Arthur S. Walters, The International Restless Legs Syndrome Study Group

Journal:

Year:

2005

Language:

english

File:

PDF, 226 KB

english, 2005

8

Increased serotonin after a suicide attempt: Coincidence or catharsis?

Peter Bräunig, Stefan Pollentier, Marie Luise Rao

Journal:

Biological Psychiatry

Year:

1988

Language:

english

File:

PDF, 258 KB

english, 1988

9

Integration of Cu and low-k dielectrics: effect of hard mask and dry etch on electrical performance of damascene structures

R.A. Donaton, B. Coenegrachts, M. Maenhoudt, I. Pollentier, H. Struyf, S. Vanhaelemeersch, I. Vos, M. Meuris, W. Fyen, G. Beyer, Z. Tokei, M. Stucchi, I. Vervoort, D. De Roest, K. Maex

Journal:

Microelectronic Engineering

Year:

2001

Language:

english

File:

PDF, 857 KB

english, 2001

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - EUV lithography imaging using novel pellicle membranes

Panning, Eric M., Goldberg, Kenneth A., Pollentier, Ivan, Vanpaemel, Johannes, Lee, Jae Uk, Adelmann, Christoph, Zahedmanesh, Houman, Huyghebaert, Cedric, Gallagher, Emily E.

Year:

2016

Language:

english

File:

PDF, 5.51 MB

english, 2016

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Unraveling the effect of resist composition on EUV optics contamination

Pollentier, I., La Fontaine, Bruno M., Naulleau, Patrick P., Neira, I., Goethals, A.-M., Gronheid, R., Tarutani, S., Tamaoki, H., Tsubaki, H., Takahashi, T.

Year:

2011

Language:

english

File:

PDF, 415 KB

english, 2011

12

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Patterning development in spin-on hard mask systems for 30nm half-pitch EUV technology

Truffert, Vincent, Pollentier, Ivan, Foubert, Philippe, Lazzarino, Frederic, Anno, Yuusuke, Wilson, Christopher J., Ercken, Monique, Gronheid, Roel, Demuynck, Steven, Buch, Xavier, Somervell, Mark H.,

Year:

2012

Language:

english

File:

PDF, 1.95 MB

english, 2012

13

Photoresist Absorption Measurement at Extreme Ultraviolet (EUV) Wavelength by Thin Film Transmission Method

Shehzad, Atif, Vesters, Yannick, Simone, Danilo De, Pollentier, Ivan, Nannarone, Stefano, Vandenberghe, Geert, De Gendt, Stefan

Journal:

Journal of Photopolymer Science and Technology

Year:

2019

Language:

english

File:

PDF, 1.58 MB

english, 2019

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Assessment of resist outgassing related EUV optics contamination for CAR and non-CAR material chemistries

Allen, Robert D., Pollentier, I., Neira, I., Somervell, Mark H., Gronheid, R.

Year:

2011

Language:

english

File:

PDF, 563 KB

english, 2011

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Characterization of EUV optics contamination due to photoresist related outgassing

La Fontaine, Bruno M., Pollentier, I., Goethals, A.-M., Gronheid, R., Steinhoff, J., Van Dijk, J.

Year:

2010

Language:

english

File:

PDF, 633 KB

english, 2010

16

[IEEE IEEE International Electron Devices Meeting - San Francisco, CA, USA (8-11 Dec. 2002)] Digest. International Electron Devices Meeting, - Line edge roughness: characterization, modeling and impact on device behavior

Croon, J.A., Storms, G., Winkelmeier, S., Pollentier, I., Ercken, M., Decoutere, S., Sansen, W., Maes, H.E.

Year:

2002

Language:

english

File:

PDF, 277 KB

english, 2002

17

[IEEE 1993 (5th) International Conference on Indium Phosphide and Related Materials - Paris, France (19-22 April 1993)] 1993 (5th) International Conference on Indium Phosphide and Related Materials - Epitaxially lifted-off GaAs MESFETs on InP for optoelectronic integration

Pollentier, I., Brys, C., Debie, P., Coppoolse, R., Martens, L., Vandewege, J., Van Daele, P., Demeester, P.

Year:

1993

Language:

english

File:

PDF, 313 KB

english, 1993

18

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Comparison of pattern placement errors as measured using traditional overlay targets and design rule structures

Leray, Philippe, Laidler, David W., Pollentier, Ivan K., Herr, Daniel J.

Year:

2003

Language:

english

File:

PDF, 168 KB

english, 2003

19

Correlated‐replicate occupancy models for wild turkey gobbling call‐count surveys

Pollentier, Christopher D., Hardy, Michael A., Lutz, R. Scott, Hull, Scott D.

Journal:

Wildlife Society Bulletin

Year:

2019

Language:

english

File:

PDF, 491 KB

english, 2019

20

Correction: Effect of molecular weight on the EUV-printability of main chain scission type polymers

Rathore, Ashish, Pollentier, Ivan, Singh, Harpreet, Fallica, Roberto, De Simone, Danilo, De Gendt, Stefan

Journal:

Journal of Materials Chemistry C

Year:

2020

File:

PDF, 1.25 MB

2020

21

Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers

Lawrie, Kirsten J., Blakey, Idriss, Blinco, James P., Cheng, Han Hao, Gronheid, Roel, Jack, Kevin S., Pollentier, Ivan, Leeson, Michael J., Younkin, Todd R., Whittaker, Andrew K.

Journal:

Journal of Materials Chemistry

Year:

2011

Language:

english

File:

PDF, 326 KB

english, 2011

22

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Measurement and analysis of EUV photoresist related outgassing and contamination

Pollentier, I., Schellenberg, Frank M., La Fontaine, Bruno M., Aksenov, G., Goethals, A.-M., Gronheid, R., Jonckheere, R., Leeson, M.

Year:

2009

Language:

english

File:

PDF, 450 KB

english, 2009

23

Assessment of Challenges in EUV Resist Outgassing and Contamination Characterization

Pollentier, Ivan, Lokasani, Ragava, Gronheid, Roel

Journal:

Journal of Photopolymer Science and Technology

Year:

2012

Language:

english

File:

PDF, 2.51 MB

english, 2012

24

Female wild turkey habitat selection in mixed forest-agricultural landscapes

Pollentier, Christopher D., Lutz, R. Scott, Drake, David

Journal:

Journal of Wildlife Management

Year:

2017

Language:

english

File:

PDF, 218 KB

english, 2017

25

Effect of molecular weight on the EUV-printability of main chain scission type polymers

Rathore, Ashish, Pollentier, Ivan, Singh, Harpreet, Fallica, Roberto, De Simone, Danilo, De Gendt, Stefan

Journal:

Journal of Materials Chemistry C

Year:

2020

File:

PDF, 1.84 MB

2020

26

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Comprehensive approach to MuGFET metrology

Lorusso, G. F., Leray, P., Vandeweyer, T., Ercken, M., Delvaux, C., Pollentier, I., Cheng, S., Collaert, N., Rooyackers, R., Degroote, B., Jurczak, M., Biesemans, S., Richard, O., Bender, H., Azordega

Year:

2006

Language:

english

File:

PDF, 583 KB

english, 2006

27

High Throughput Grating Qualification for Rating Directed Self-Assembly Pattern Performance using Optical Metrology

Gronheid, Roel, Van Look, Lieve, Delgadillo, Paulina Rincon, Pollentier, Ivan, Gao, Yi, Lin, Guanyang, Nealey, Paul F.

Journal:

Journal of Photopolymer Science and Technology

Year:

2013

Language:

english

File:

PDF, 872 KB

english, 2013

28

Recent Advancements in EUV Resist Materials and Process Performance

Goethals, Anne Marie, Niroomand, Ardman, Van Roey, Frieda, Hosokawa, Kohei, Pollentier, Irvan

Journal:

Journal of Photopolymer Science and Technology

Year:

2011

Language:

english

File:

PDF, 946 KB

english, 2011

29

Measurements on the magnetic susceptibilities of Ag-Mn and Cu-Mn alloys

A. Van Itterbeek, R. Pollentier, W. Peelaers

Journal:

Applied Scientific Research

Year:

1957

Language:

english

File:

PDF, 260 KB

english, 1957

30

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Status of ArF lithography for the 130-nm technology node

Ronse, Kurt G., Vandenberghe, Geert, Jaenen, Patrick, Delvaux, Christie, Vangoidsenhoven, Diziana, Van Roey, Frieda, Pollers, Ingrid, Maenhoudt, Mireille, Goethals, Anne-Marie, Pollentier, Ivan K., Vl

Year:

2000

Language:

english

File:

PDF, 4.27 MB

english, 2000

31

Epitaxial lift-off GaAs LEDs to Si for fabrication of opto-electronic integrated circuits

Pollentier, I., Demeester, P., Ackaert, A., Buydens, L., Van Daele, P., Baets, R.

Journal:

Electronics Letters

Year:

1990

Language:

english

File:

PDF, 231 KB

english, 1990

32

SPIE Proceedings [SPIE Physical Concepts of Materials for Novel Optoelectronic Device Applications - Aachen, Federal Republic of Germany (Sunday 28 October 1990)] Physical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization - Fabrication of high-radiance LEDs by epitaxial lift-off

Pollentier, Ivan K., Ackaert, Ann, De Dobbelaere, Peter M., Buydens, Luc, Van Daele, Peter, Demeester, Piet M. A., Razeghi, Manijeh

Year:

1991

Language:

english

File:

PDF, 444 KB

english, 1991

33

Metal-containing Materials as Turning Point of EUV Lithography

De Simone, Danilo, Pollentier, Ivan, Vandenberghe, Geert

Journal:

Journal of Photopolymer Science and Technology

Year:

2015

Language:

english

File:

PDF, 689 KB

english, 2015

34

Measurements on the magnetic susceptibilities of Ag-Mn and Cu-Mn alloys

A. Van Itterbeek, R. Pollentier, W. Peelaers

Journal:

Applied Scientific Research, Section B

Year:

1959

Language:

english

File:

PDF, 252 KB

english, 1959

35

[IEEE IEEE 2000 International Interconnect Technology Conference - Burlingame, CA, USA (5-7 June 2000)] Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407) - Lithography as a critical step for low-k dual damascene: from 248 nm to 193 nm

Ronse, K., Maenhoudt, M., Pollentier, I., Wiaux, V., Struyf, H., Lepage, M., Vanhaelemeersch, S.

Year:

2000

Language:

english

File:

PDF, 281 KB

english, 2000

36

[IEEE Third International Conference Indium Phosphide and Related Materials - Cardiff, UK (8-11 April 1991)] [Proceedings 1991] Third International Conference Indium Phosphide and Related Materials - Fabrication of long wavelength QEICs using GaAs on InP epitaxial lift-off technology

Pollentier, I., Demeester, P., Van Daele, P., Rondi, D., Glastre, G., Enard, A., Blondeau, R.

Year:

1991

Language:

english

File:

PDF, 384 KB

english, 1991

37

Epitaxial lift-off and its applications

Demeester, P, Pollentier, I, Dobbelaere, P De, Brys, C, Daele, P Van

Journal:

Semiconductor Science and Technology

Year:

1993

Language:

english

File:

PDF, 1.31 MB

english, 1993

38

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Electrical linewidth metrology for sub-65-nm applications

Storms, Greet, Silver, Richard M., Cheng, Shaunee, Pollentier, Ivan

Year:

2004

Language:

english

File:

PDF, 491 KB

english, 2004

39

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Data Analysis and Modeling for Process Control - In-line lithography cluster monitoring and control using integrated scatterometry

Pollentier, Ivan, Tobin, Jr., Kenneth W., Cheng, Shaunee Y., Baudemprez, Bart, Laidler, David, van Dommelen, Youri, Carpaij, Rene, Yu, Jackie, Uchida, Junichi, Viswanathan, Anita, Chin, Doris, Barry,

Year:

2004

Language:

english

File:

PDF, 513 KB

english, 2004

40

Social dysfunction in mood disorders and schizophrenia: Clinical modulators in four independent samples

Porcelli, Stefano, Kasper, Siegfried, Zohar, Joseph, Souery, Daniel, Montgomery, Stuart, Ferentinos, Panagiotis, Rujescu, Dan, Mendlewicz, Julien, Pich, Emilio Merlo, Pollentier, Stephane, Penninx, Br

Journal:

Progress in Neuro-Psychopharmacology and Biological Psychiatry

Year:

2019

File:

PDF, 8.25 MB

2019

41

Recent developments in relaxed and strained lattice mismatched heterostructures

P. Demeester, G. Coudenys, L. Buydens, A. Ackaert, I. Moerman, I. Pollentier, P. van Daele

Journal:

Materials Science and Engineering: B

Year:

1991

Language:

english

File:

PDF, 755 KB

english, 1991

42

[IEEE Summer Topical Meeting Digest on Broadband Analog and Digital Optoelectronics, Optical Multiple Access Networks, Integrated Optoelectronics, Smart Pixels - Santa Barbara, CA, USA (29 July-12 Aug. 1992)] Summer Topical Meeting Digest on Broadband Analog and Digital Optoelectronics, Optical Multiple Access Networks, Integrated Optoelectronics, Smart Pixels - Optimization And Reliability Of Epitaxial Lift-off For OEIC Fabrication

Pollentier, I., Demeester, P., Van Daele, P., Martens, L.

Year:

1992

File:

PDF, 168 KB

1992

43

SPIE Proceedings [SPIE SPIE Photomask Technology - San Jose, California, United States (Monday 12 September 2016)] Photomask Technology 2016 - Introducing the EUV CNT pellicle

Kasprowicz, Bryan S., Buck, Peter D., Lee, Jae Uk, Vanpaemel, Johannes, Pollentier, Ivan, Adelmann, Christoph, Zahedmanesh, Houman, Huyghebaert, Cedric, Timmermans, Marina, De Volder, Michael, Gallagh

Year:

2016

Language:

english

File:

PDF, 759 KB

english, 2016

44

Relaxed lattice-mismatched growth of III–V semiconductors

P. Demeester, A. Ackaert, G. Coudenys, I. Moerman, L. Buydens, I. Pollentier, P. Van Daele

Journal:

Progress in Crystal Growth and Characterization of Materials

Year:

1991

Language:

english

File:

PDF, 4.33 MB

english, 1991

45

Eastern wild turkey demography: Sensitivity of vital rates between landscapes

Pollentier, Christopher D., Hull, Scott D., Lutz, R. Scott

Journal:

Journal of Wildlife Management

Year:

2014

Language:

english

File:

PDF, 338 KB

english, 2014

46

Common Loon ( Gavia immer ) Eggshell Thickness and Egg Volume Vary with Acidity of Nest Lake in Northern Wisconsin

Pollentier, Christopher D., Kenow, Kevin P., Meyer, Michael W.

Journal:

Year:

2007

Language:

english

File:

PDF, 109 KB

english, 2007

47

GaAs/AlGaAs multiple-quantum-well vertical optical modulators on glass using the epitaxial lift-off technique

Buydens, L., De Dobbelaere, P., Demeester, P., Pollentier, I., Van Daele, P.

Journal:

Year:

1991

Language:

english

File:

PDF, 505 KB

english, 1991

48

[BMJ Publishing Group Ltd 32nd Triennial Congress of the International Commission on Occupational Health (ICOH), Dublin, Ireland, 29th April to 4th May 2018 - ()] Musculoskeletal Disorders - 778 A multidisciplinary case study to optimise ergonomic work conditions in a new distribution centre at the world’s leading sports brand

Maes, N, Pollentier, G, Acke, S, Verbeek, E, Delaruelle, D, Eerdekens, K, Schmickler, M-N

Year:

2018

Language:

english

File:

PDF, 59 KB

english, 2018

49

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Optimization of scatterometry parameters for shallow trench isolation (STI) monitor

Leray, Philippe J., Silver, Richard M., Cheng, Shaunee, Kremer, Stephanie, Ercken, Monique, Pollentier, Ivan

Year:

2004

Language:

english

File:

PDF, 215 KB

english, 2004

50

P.579 Combining pharmacotherapy of BI 425809 with computerised cognitive training in schizophrenia: initial experience of a large-scale multicentre randomised clinical trial

Hake, S., Huang, S., McDonald, S., Pollentier, S., Podhorna, J., Harvey, P.

Journal:

European Neuropsychopharmacology

Year:

2020

File:

PDF, 159 KB

2020

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